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Processing
1. New User Preparation
2. Processing Basics
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
6.1 Photoresists
6.2 Developers
6.3 Resist Stripper
6.4 Solvents
6.5 Acids
6.5.1 Sulfuric acid
6.5.2 Hydrofluoric acid
6.5.3 Hydrochloric acid
6.5.4 Nitric acid
6.5.5 Acetic acid
6.5.6 Al etchant type A
6.5.7 Chromium Etch 1020AC
6.6 Bases
6.7 Oxidizers
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
6.5.2 Hydrofluoric acid
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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