IMS- Micro/Nano Fabrication Facility
M: Imaging

Often thought of for showing the final MEMS device, taking images along the way can help identify potential issues. Optical microscopes are often used to see if photoresist could be over or under developed. Sems can let users see how large the surface grains are on top, or with the use of cross-sectioning the grains develop through out the structure. Grain sizes can often be related to the electrical, mechanical and thermal performance of a material. Some of the SEMs are equiped with EDX/EDS which allow for potential identification of the alloys at interfaces.  

Tool

Pro's (+) 

Cons (-)

Veeco AFM

surface roughness, grain size higher learning curve, outside the cleanroom
     

Wyko Profilometer NT3300

   
     

Zeiss Ultra60 FE-SEM 

 

outside the cleanroom
     

Leo 1530 FE-SEM (Pettit)

   
     

Hitachi S-3500H (Pettit)

   
     

Hitachi S-3700 N VP-SEM (Marcus Organic)

non-conductive samples (dielectrics) and wet/moist samples such as cultured cells, without traditional sample preparation (gold coating/drying)., sample stage temperature -10F and 120F and control sample vapor pressure -Magnification range: x5 – x300,000, -Resolution @ 30kV (SE in High Vacuum Mode): 3nm, -Resolution @ 30kV (BSE in 6Pa Low Vacuum Mode): 4nm
     

Hitachi S-4700

cold field emission high resolution scanning electron microscope. This SEM permits ultra high resolution imaging of thin films and semi-conductor materials on exceptionally clean specimens.  
     

Various Optical Microscopes

   
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu