| Standard Recipes | Cleanroom Basic Guides |
This page contains processing information and recipes for the various pieces of equipment and chemicals in the cleanroom. The recipes are made available to serve as examples and templates for users that need specific processes. Many of them have been provided by the equipment manufacturer as examples of processes which they have tested and verified to be both functional and safe for the equipment.
Please note the links for "Georgia Tech access only" will take you to IEN's sharepoint. You can easily use the search on left hand column to filter through recipes and baseline tests. Depending on the circumstance, a request may be placed for a temporary link to access "Georgia Tech access only" items.
Recipes, Troubleshooting & Data
Standard recipe provided by the manufacturers (STS PECVD , PlasmaTherm deposition,RIE&ICP) for use in their processing tools. Georgia Tech access only-put your gatech e-mail as the user name microsoft will redirect to GT login.
Reports on the based oon test runs on IEN tools to check film uniformity on deposition tools or etch rate on etching tools.
Standard recipe used in the IEN cleanroom in the processing tools.
The National Nanotechnology Infrastructure Network (NINN) had a Research Experience for Teachers (RET) fellowship which sponsored teachers and community college faculty at Georgia Tech from (2006-2009) to let them activally engage in cleanroom research. The presentations associated with the program include examing RIE etching of standard PECVD processes, comparing the resist SPR 220-7 selectivity on Si when ICP etching, and effects of process parameters during PECVD SiNx deposition.
Please note that these are records collected through over the decade. Georgia Tech access only-put your gatech e-mail as the user name microsoft will redirect to GT login.ch ac
Basic Cleanroom Guides
These modules are standardized procedures for various tasks accomplished in the cleanroom. Each module consists of list of necessary supplies and the procedures that should be followed during that processing step. We have also tried to include common mistakes and questions about each processing step. These procedures should help with repeatability in our facility and help you standardize your process. Both new and old users show find this information useful.
Example document of a process flow.
If you want to bring a material (targets, source materials, gases, chemicals) in to the cleanroom, please fill out this form. Thank you.
in terms of processing
To avoid cross contamination, supply your own items.
Georgia Tech access only -put your gatech e-mail as the user name microsoft will redirect to GT login.