IMS- Micro/Nano Fabrication Facility
Processing Fundamentals

Substrate Cleaning

Solvent Clean; CMOS Clean; Plasma Clean; Descum

Thin Film Deposition

PVD: Evaporation; Sputtering

CVD: PECVD; LPCVD; ALD

Etching

Plasma Dry Etch: RIE; DRIE/ICP:

Chemical Dry Etch: XeF2 Etch

Lithography

Spin Coating; Spray Coating; Mask Lithography; Maskless Lithography

Thermal Processing

Oxide Growth;Doping

Metrology

Profilometry; Ellipsometry; Stress Measurement; Particle Measurement; Surface Charge Analysis

Contact Information
Hang Chen, Ph.D.
Process Support Manager
Phone Number: 404.894.3360
Email Address: hang.chen@ien.gatech.edu