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IMS- Micro/Nano Fabrication Facility
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Processing
1. New User Preparation
2. Processing Basics
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
5.1 Process Selection
5.1.1 Wet Etch vs Dry Etch
5.1.2 SiO2 Deposition vs Growth
5.1.3 Evaporation vs. Sputtering
5.2 Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
5.1.3 Evaporation vs. Sputtering
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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