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IMS- Micro/Nano Fabrication Facility
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Processing
1. New User Preparation
2. Processing Basics
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
5.1 Process Selection
5.2 Equipment Selection
5.2.1 PECVD
5.2.2 ALD
5.2.3 Mask/Maskless Aligners
5.2.4 Spinners/Spray Coaters
5.2.5 RIE
5.2.6 ICP
5.2.7 Sputtering
5.2.8 Evaporation
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
5.2.6 ICP
ICP Tools for Various Materials' Etching Processes
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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