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Processing
Equipment Baseline
Baseline Reports 2019 4th quarter
Baseline Reports-old
ALD
ALD oxide chamber HfO2 150C
ALD oxide chamber HfO2 250C 2019-1
ALD oxide chamber plasma SiO2 150C
ALD oxide chamber Plasma TiO2 250C 2019-2
ALD oxide chamber Thermal TiO2 150C 2019-1
ALD oxide thermal Al2O3 250C 2019
ALD Plasma ZnO2
ALD Thermal ZnO2
Baseline report for ALD metal chamber plasma SiO2 150C
Baseline report for ALD metal chamber plasma TiO2 250C
Baseline report for ALD oxide chamber plasma TiO2 250C after cleaning
Cambridge ALD Metal Chamber
Cambridge ALD Metal Chamber plasma SnO2
Cambridge ALD Oxide Chamber
DRIE
Evaporator
PECVD
Photolithography
RIE
Sputtering
Thermal Furnaces
Baseline Reports 2020 1st Quarter
Process Support Team
Processing Fundamentals
Processing Information
Recipe Library
Cambridge ALD Oxide Chamber
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu
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