Baseline Reports 2019 4th quarter

Equipment	Recipe	Engineer	Date	Download Link

STS Pegasus ICP	Standard Deep Si Etch	Pradip Basnet	2019-11-21	Report
STS ICP	Mod1	Pradip Basnet	2019-10-25	Report
Plasma-Therm ICP	Standard SiO₂	Pradip Basnet	2019-09-20	Report
Oxford End-Point RIE	Standard Oxide Etch	Pradip Basnet	2019-10-18	Report
Unaxis RIE	Std_Ox	Pradip Basnet	2019-10-18	Report
Vision RIE #1	Standard Oxide	Pradip Basnet	2019-09-26	Report
Ctrlayer RIE #2	Standard SiO2	Pradip Basnet	2019-10-02	Report
STS HRM-ICP	GENMEMS	Pradip Basnet	2019-10-02	Report
PVD75 RF Sputterer	Ti	Pradip Basnet	2019-10-04	Report
Denton Discovery RD/DC Sputter	TiN	Pradip Basnet	2019-10-04	Report
SCS G3P8 Spinner	Spin Curves	Chinaza Ogbona	2019-09-18	Report
Cambridge Fiji ALD - metal chamber	Thermal TiO2	Chris Yang	2019-10-21	Report
Cambridge Fiji ALD - metal chamber	Plasma TiO2	Chris Yang	2019-09-27	Report
Cambridge Fiji ALD - metal chamber	Thermal Al2O3	Chris Yang	2019-09-17	Report
Cambridge Fiji ALD - metal chamber	Plasma Al2O3	Chris Yang	2019-09-27	Report
Cambridge Fiji ALD - metal chamber	Thermal HfO2	Chris Yang	2019-09-24	Report
Cambridge Fiji ALD - metal chamber	Plasma HfO2	Chris Yang	2019-09-26	Report
Cambridge Fiji ALD - oxide chamber	Plasma SiO₂	Chris Yang	2019-10-03	Report
Oxford ICP-PECVD	Standard SiO₂	Chris Yang	2019-09-30	Report
Oxford ICP-PECVD	Standard SiN	Chris Yang	2019-09-20	Report
STS PECVD 3	Standard SiO₂	Chris Yang	2019-09-19	Report
STS PECVD 3	Standard SiN	Chris Yang	2019-09-25	Report
Unaxis PECVD	Std_Ox	Chris Yang	2019-11-20	Report

Related Media

STS HRM - Si etch - 2019-10

Vision RIE 1 - SiO2 2019-Q4

Contact Information

Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu