Baseline Reports-old -

Baseline Reports-old

ALD

Cambridge ALD Oxide Chamber

Cambridge ALD Metal Chamber

Cambridge ALD Metal Chamber plasma ZnO2

Cambridge ALD Metal Chamber thermal ZnO2

Cambridge ALD Metal Chamber plasma SnO2

Cambridge ALD Metal Chamber plasma SiO2

Cambridge ALD Oxide Chamber plasma TiO2 - 1

Cambridge ALD Metal Chamber plasma TiO2

Cambridge ALD Oxide Chamber plasma SiO2

Cambridge ALD Oxide Chamber plasma HfO2

Cambridge ALD Oxide Chamber plasma HfO2 - 1

Cambridge ALD Oxide Chamber thermal TiO2 - 1

Cambridge ALD Oxide Chamber plasma TiO2 - 2

Cambridge ALD Oxide Chamber plasma Al2O3 - 1

Thermal Furnace

Tystar Nitride 4

Tystar Nitride 4 LSN

Tystar Mini 1 2019-1

Tystar Mini 2 2019-1

Tystar Poly 2 2019-2

Tystar Nitride 3 2019-2

Tystar Mini 1 2019-2

Tystar Mini 2 2019-2

Tystar Nitride 4 LSN 2019-2

Tystar Furnace Lifetime Test

PECVD

STS PECVD 3 SiO2 2019-1

STS PECVD 3 SiNx 2019-1

Unaxis PECVD SiO2 2019-1

Evaporator

CHA2 E-beam Evaporator

Sputterer

RIE

Advance Vacuum RIE

Oxford End-point RIE

DRIE

Photolithography

S 1813

Contact Information

Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu