*Note to do backside alignement you need to be able to check out the backside aligment chuck for the Karl Suss tools (link)

** Small Pieces can be processed by using either a carrier wafer or bluetape

• Electron beam lithography: a beam of electrons directly writes in resist to create very small structures and it was developed for manufacturing integrated circuits, and is also used for creating nanotechnology architectures.
• Nano-imprint lithography: fabricates nanometer scale patterns at low cost, high throughput and high resolution by creating patterns through mechanical deformation of imprint resist and subsequent processes.
• Nanoscribe:the next generation 3D laser lithography system.
• MICROTECH LaserWriter system: a laser beam is controlled as a writing tool for photolithographic mask fabrication or for direct in situ processing on planar substrates (maximum resolutions down to 0.7 µm)