IMS- Micro/Nano Fabrication Facility
Processing Materials

The chemicals listed in the tables below are common chemicals (i.e. photoresist, developers, acids, etchants, bases, & solvents) found in IEN cleanroom facilities. For a more comprehensive list for chemicals and associated files (e.g. SDS, technical datasheets) please refer to the chemical section in IEN department chemical tab on SUMS page. Manufacturer's websites are also good references to find out more specific processing information.

Understand the possible reactions when mixing chemicals.

Many processing steps require mixing liquid chemicals together. Users should make themselves aware of the chemical reactions possible when mixing chemicals in order to minimize the risk to themselves and others around.

For example, always add acids to water. Adding water to an acid causes a highly exothermic reaction which can cause a fire and release dangerous gases into the air.


Photoresists/Primer

Resist/Primer Manufacturer Provided Cabinet Location
HMDS/Microposit Primer- P20 Microchem Corp. Yes Solvent -  amber contianer
SPR 220 Microchem Corp.  Yes Solvent -  amber contianer
SC 1813 Positive Photoresist Microchem Corp. Yes Solvent -  amber contianer
SC 1827 Positive Photoresist Microchem Corp. Yes Solvent -  amber contianer
NR71-3000P Negative Photoresist Futurrex, Inc. Yes Solvent -  amber contianer
NR9-1500PY Negative Photoresit Futurrex, Inc. Yes Solvent -  amber contianer
SU-8 Microchem Corp. No Solvent 

 

Developers

Developers Manufacturer Provided Cabinet Location
1165 Remover Microchem Corp.  No Solvent
MF-319 Developer Microchem Corp. Yes Base
351 Developer Microchem Corp. Yes Base
Resist Developer RD6 Futurrex, Inc. No  

 

Acid

Acid Manufacturer Provided Cabinet Location
Acetic Acid Brenntag Yes Acid
Hydrochloric Acid Brenntag Yes Acid
Hydrofuric Acid Brenntag Yes Acid
Nitric Acid Brenntag Yes Acid
Sulfuric Acid Brenntag Yes Acid
Phosphoric Acid Brenntag Yes Acid

 

Etchants

Etchant Manufacturer Provided Cabinet Location
Aluminum Etchant Type A Brenntag Yes  
Buffered Oxide Etch (6:1) Brenntag Yes  
Chromium Etchant Brenntag Yes  

.

Bases

Developers Manufacturer Provided Cabinet Location
Ammonium Hydroxide Brenntag Yes Base
Hydrogen Peroxide Brenntag Yes Base
Potassium Hydroxide (30%) Doe & Ingalls Yes Base

 

Solvents

Solvent Manufacturer Provided Cabinet Location
Acetone Brenntag Yes Solvent
Isopropanol Brenntag  Yes Solvent
Methanol Brenntag Yes Solvent 
Trichloroethylene Brenntag Yes Solvent 

 

 

Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu