IMS- Micro/Nano Fabrication Facility
General Polymer Etching Reference

Etch Rate for Resists, Parylene, Polyimdes (nm/min)

   S1800 Positive Reist  Furrex Negative Reist  Parylene C Polyimde
 Piranha  >92,000 >59,000  2.6  >17,000
 MicroStripper  >94,000  >60,000  N/A  520
 Acetone  >176,000  >87,000  0.77  0

 


*Cited from JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 12, NO. 6, DECEMBER 2003

Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu