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Processing
Equipment Baseline
Process Support Team
Processing Fundamentals
Doping Process
Etching Process
Lithography
Metrology
Substrate Cleaning
Thermal Processing
Thin Film
Dielectrics Deposition (non-thermal)
Metal Deposition Process
Thermal Growth
Gate Oxide
Oxidation
Dry Oxidation
Wet Oxidation
Tystar Furnace
Poly-Silicon
Semi Insulating Polycrystalline Silicon
Thermal Nitride
Thermal Oxide
Processing Information
Recipe Library
Tystar Furnace
Equipment
Tystar Furnace
Temperature (°C)
800 - 1150
Pressure (mT)
atm
Gas 1 (sccm)
O
2
- 1000
Gas 2 (sccm)
H
2
- 1850
Rate (Å/min)
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