IMS- Micro/Nano Fabrication Facility
Poly-Silicon
Temperature (°C)
Temperature (°C)
 580 - 650 (Lower Temperature, Lower Stress)
Amorphous Silicon Temperature Lower than 570
Pressure (mTorr)
 200 - 400
Gas (sccm)
     SiH4: 50 - 100 Polysilicon
     SiH4: 50 - 100 PH3 2-4 sccm (Increase PH3 Lower Resistivity) 
       SiH4: 20 - 50 for Amorphous Silicon
Refractive Index
 4.0
Rate (Å/min)
 50 - 100 (Lower T/P, Lower Dep. Rate)
 Rate (Å/min)
  20 - 40 (for Amorphous Silicon)

 

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