Solvent Clean (AMI Clean): 

     For basic cleaning, a simple rinse with acetone, methanol and isopropanol can be used

CMOS Clean

     Piranha: Used to remove organics off of substrate: 4:1 solution of H2SO4 (sulfuric acid) : H2O2 (hydrogen peroxide) at 120°C

    SCI: Used to remove particles, organics and some metals: 1:1:5 solution of NH4OH (ammonium hydroxide) : H2O2 (hydrogen peroxide) : H2O at 75-80°C 

    SCII: Used to remove metallic contamination: 1:1:6 solution of HCl (hydrogen chloride) : H2O2 (hydrogen peroxide) + H2O (water) at 75-80°C

Plasma Clean