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Processing
Equipment Baseline
Process Support Team
Processing Fundamentals
Doping Process
Etching Process
Lithography
Metrology
Substrate Cleaning
Thermal Processing
Thin Film
Dielectrics Deposition (non-thermal)
Metal Deposition Process
Thermal Growth
Gate Oxide
Oxidation
Poly-Silicon
Semi Insulating Polycrystalline Silicon
Thermal Nitride
Thermal Oxide
High Temperature
Low Temperature
Processing Information
Recipe Library
Low Temperature
Temperature (°C)
400 - 450
Pressure (mT)
200 - 400
Gas 1 (sccm)
SiH
4
- 85
Gas 2 (sccm)
O
2
- 120
Refractive Index
1.45
Rate (Å/min)
100 - 120
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