IMS- Micro/Nano Fabrication Facility
Thermal Oxide Film Growth

Low Temperature

Temperature (°C)
400 - 450
Pressure (mT)
200 - 400
Gas 1 (sccm)
SiH4 - 85
Gas 2 (sccm)
O2 - 120
Refractive Index
1.45
Rate (Å/min)
100 - 120

High Temperature

Temperature (°C)
700 - 850
Pressure (mT)
200 - 400
Gas 1 (sccm)
N2O - 100
Gas 2 (sccm)
SiH2Cl2: 10 - 25
Refractive Index
1.45
Rate (Å/min)
50 - 100