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Processing
Equipment Baseline
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Processing Fundamentals
Doping Process
Etching Process
Lithography
Metrology
Substrate Cleaning
Thermal Processing
Annealing/Sintering
Film Growth
Oxidation Film Growth
Poly-Silicon Film
Semi Insulating Polycrystalline Silicon
Thermal Nitride Film Growth
Thermal Oxide Film Growth
Thin Film
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Semi Insulating Polycrystalline Silicon
Temperature (°C)
700 - 850
Pressure (mT)
200 - 400
Gas 1 (sccm)
N
2
O - 100
Gas 2 (sccm)
SiH
4
: 10 - 25
Refractive Index
1.45
Rate (Å/min)
50 - 100
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