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IMS- Micro/Nano Fabrication Facility
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Processing
Equipment Baseline
Process Support Team
Processing Fundamentals
Doping Process
Etching Process
Lithography
Metrology
Substrate Cleaning
Thermal Processing
Annealing/Sintering
Film Growth
Oxidation Film Growth
Dry Oxidation Film Growth
Wet Oxidation Film Growth
Poly-Silicon Film
Semi Insulating Polycrystalline Silicon
Thermal Nitride Film Growth
Thermal Oxide Film Growth
Thin Film
Processing Information
Recipe Library
Dry Oxidation Film Growth
Tystar Furnace
Equipment
Tystar Furnace
Temperature (°C)
800 - 1150
Pressure (mT)
atm
Gas (sccm)
O
2
- 3000
Rate (Å/min)
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