Technics Micro RIE - Georgia Tech Biocleanroom; Technics Micro RIE; Etch a thin film from a substrate or work piece; Etchable materials: silicon nitride, silicon dioxide, single crystal and poly silicon

Technics Micro RIE

Keywords: Lithography, UV, etch, oxide, clean, wafer

Information

Schedule

Training

Equipment Description

The Georiga Tech Technics Micro RIE -- Pettit Cleanroom.

Functions

Materials etched

Gases

Substrate

Institute	Georgia Tech
Department	IMS- Micro/Nano Fabrication Facility
Sub Tool Of	Pettit Cleanroom

Applications	Can be used to Etch: -Silicon Dioxide -Silicon Nitride -Silicon -Aluminum and Alloys -Regractory Metal Silicides -Chrome -Gallium Arsenide and Alloys -Indium Tin Oxide -Polyamides -Photoresist