The Georgia Tech SCS G3 Spin Coater series, located in the Georgia Tech Biocleanroom, accurately applies liquid coating materials on planar substrates. This spin coater stores and executes up to 30 programs with up to 20 steps each. Each step of the cycle can be defined in the range of 0-9999RPM with ramp times from 0.1 to 25.5 seconds. Ramp-up time is dependent on the chuck size and the substrate weight. A single step may have a dwell time of up to 999 seconds. Coating cycles are interruptible by the operator at any time. This spin coater has chucks designed for wafers or pieces 1-4 inches.