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Processing
Equipment Baseline
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Processing Fundamentals
Doping Process
Etching Process
Lithography
Metrology
Substrate Cleaning
Thermal Processing
Thin Film
Dielectrics Deposition (non-thermal)
Metal Deposition Process
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Oxidation
Poly-Silicon
Semi Insulating Polycrystalline Silicon
Thermal Nitride
Thermal Oxide
Processing Information
Recipe Library
Semi Insulating Polycrystalline Silicon
Temperature (°C)
700 - 850
Pressure (mT)
200 - 400
Gas 1 (sccm)
N
2
O - 100
Gas 2 (sccm)
SiH
4
: 10 - 25
Refractive Index
1.45
Rate (Å/min)
50 - 100
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