IEN - Micro/Nano Fabrication Facility
Gasonics Asher (Inorganic)
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Equipment Description

The Georgia Tech Aura 1000 Asher is a microprocessor controlled downstream, or "afterglow", photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute.

Functions

  • Photoresist stripper for front and backsides of wafers
  • Descum (200-500 angstroms of photoresist)
  • Remove max 1 micron each run

Component specifications

  • Load arm

Gases

  • O2 and N2

Substrate

  • 4” wafers
  • 1-10 wafers per run

Temperatures

  • 25-200°C
Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
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