IEN - Micro/Nano Fabrication Facility
2018-06-06 Event

IEN provides cross-discipline support for nanoscale lithography, fabrication, synthesis, characterization, modeling, design, computation, and hands-on training via our shared user cleanroom environments. This event is designed to give current and potential users the opportunity to tour the cleanrooms, observe tool demonstrations, and hold processing and fabrication methods consultations with our expert staff, free of charge. Additionally, IEN staff will offer technical consultation to attendees who register in advance.

Registered visitors at this event will be free of cleanroom charges.

Time and Location:

Date:               Wednesday, Jun. 6th

Time:               9:00am – 12:00pm

Location:         Marcus Inorganic cleanroom (located in Marcus Nanotechnology Building 1st floor)

Schedule:

9:00 – 9:30          Registration and gowning

9:30 - 10:00           Inorganic cleanroom tour

10:00 - 10:45           Maskless photolithography process demo (Inroganic cleanroom);

10:45 - 11:30           Inorganic cleanroom metrology technique demo (SEM, profilometry, Ellipsometry)

11:30-12:00            Inorganic cleanroom tour (make-up)

Dress Code:

There is a mandatory dress code for access to the IEN clean room which must be adhered to.

Shoes: Socks or stockings are required. Shoes must be closed-toe shoes that fully enclose the heel and the top of the foot. Additionally, the shoes must not have a high heel (over one inch) or a deep cleat that may hold mud or other dirt. Also, your shoes must be clean and dry when you enter the facility.

Not Allowed: Sandals, open weave shoes, or shoes that expose the top of the foot.   

Shirt: Your shirt must be at least a short sleeve shirt that is long enough to reach your pants (no bare midriffs) and it must not have a deep neckline.

Not Allowed: Tank tops, halter tops, and spaghetti strap tops.  

Pants: Pants must be full-length, from waist to ankle.

Not Allowed: Shorts or short pants, tight pants. NO skirts or dresses.

Registration: