The Georgia Tech KLA Tencor 6100 is a non-pattered optical surface analyzer, capable of 2"-4" or 4"-8" bare Si wafers. The unit can detect 0.16um @ 95% capture rate based on PSL NIST Calibration Standard and accuracy is within 2% based on Approved Calibration Standard. This optical surface analyzer is the ideal wafer surface defect detection system for failure analysis and process development applications.
NOTE: the system cannot scan small Si wafer pieces nor any kind of glass slides.