Georgia Tech ICP (Induced Coupled Plasma) Etching is a frequently used etch technology in semiconductor fabrication. ​​ ICP systems generate a high density plasma which allow for high etch rates as well as high etch uniformity.

Commonly used for etching Gallium Nitride, Silicon structures, as well as Tungsten.

Plasma Therm ICP F-, Cl- chemistry based non-Bosch process	STS HRM ICP Bosch process for Si etch only
STS Pegasus ICP Bosch process for Si etch only	STS AOE ICP Pro F- chemistry based non-Bosch process