IEN - Micro/Nano Fabrication Facility
Schmid APCVD


 

Information
Schedule
Training
Equipment Description

The Georgia Tech Schmid APCVD is an atmospheric pressure roller furnace designed to deposit phosphorous or boron doped SiO2, undoped SiO2, and Al2O3.  A second chamber is available for in-situ SiO2 encapsulation immediately after the initial deposition layer.  

Specifications:
    - up to 550C process temperature
    - up to 6" square samples (up to 0.20"/5.0mm thick)
    - typically 24-48 in/min roller speed

 

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
 Marcus Inorganic Cleanroom
Related Links
Contact Information
Georgia Institute of Technology
Shared User Management System
791 Atlantic Drive
Atlanta GA 30332-0269 
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